Sign In | Join Free | My disqueenfrance.com
China JINXING MATECH CO LTD logo
JINXING MATECH CO LTD
JINXING MATECH is an expert provider on the metal solution. Especially on the products such as Tungsten Alloy , Tungsten copper , Titanium , Zirconium, Vanadium, Hafnium, Sputtering target , Nobel
Site Member

6 Years

Home > Sputtering Targets >

Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating

JINXING MATECH CO LTD
Contact Now

Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating

Brand Name : Zirconium Sputtering Target for Thin Film Coating

Model Number : plates

Certification : ASTM

Place of Origin : China

MOQ : Negotiable

Price : 100USD-200USd

Payment Terms : L/C, T/T

Supply Ability : 10ton/month

Delivery Time : 10-30days

Packaging Details : Standard packing

State : annealed

Rm(≥)/MPa : 379

Rp0.2(Pa : 207

A50mm(≥)/% : 16

name : Zirconium Sputtering Target for Thin Film Coating

material : Zr702, Zr704, Zr705

Contact Now

Zirconium Sputtering Target for Thin Film Coating

We specializes in producing high purity Zirconium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. We specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. We also casts any of the rare earth metals and most other advanced materials into rod, bar, or plate form, as well as other machined shapes. Other shapes are available by request.

Zirconium Sputtering Target Picture:
Zr704 Zr705 Zirconium Sputter Target For Thin Film CoatingZr704 Zr705 Zirconium Sputter Target For Thin Film CoatingZr704 Zr705 Zirconium Sputter Target For Thin Film Coating

Our Main Equipment

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center,

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc

Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment.


Product Tags:

Zr705 Zirconium Sputter Target

      

Zr704 Zirconium Sputter Target

      

Thin Film Zirconium Sputter Target

      
China Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating wholesale

Zr704 Zr705 Zirconium Sputter Target For Thin Film Coating Images

Inquiry Cart 0
Send your message to this supplier
 
*From:
*To: JINXING MATECH CO LTD
*Subject:
*Message:
Characters Remaining: (0/3000)
 
Inquiry Cart 0